The sixth session of 11th National People's Congress Standing Committee has approved, by 154 votes in favor and four abstentions, to amend China's Patent Law to encourage local R&D. Under the latest revision of the legislation, originally adopted in 1985, applications will be allowed to be filed outside China before being made domestically, although there is a requirement for scrutiny by a government agency to determine if a national security restriction should be imposed.
Chen Guangjun, a spokesman for the NPC's Education, Science, Culture and Health Committee, told reporters that the changes will improve China's international competitiveness. The new policy means that firms conducting R&D in China will find it easier to obtain intellectual property protection worldwide. Filings increased over 32% in 2006.
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